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Zeiss presentation - Orion nanofab He ion microscope Friday 01/14 at noon
by Abrol, Sangeeta Saddul 13 Jan '22

13 Jan '22

Dear all, Please find here the link for the Zeiss presentation tomorrow at noon. Zeiss will be talking about the Orion nanofab He ion microscope, capabilities and current applications. They will be also responding to any questions we might have about the system. This talk is open to any potential user so you can pass this link to any student, researcher, or faculty that might be interested. Best, Rosa Topic: Zeiss Orion Nanofab talk Time: Jan 14, 2022 12:00 PM Indiana (East) Join Zoom Meeting https://purdue-edu.zoom.us/j/94584316151?pwd=Y3JOYjFhSlhrT0ZWUG0wOVROamhvQT…<https://eur01.safelinks.protection.outlook.com/?url=https%3A%2F%2Fpurdue-ed…> Meeting ID: 945 8431 6151 Passcode: zeiss One tap mobile +13126266799,,94584316151#,,,,*442850# US (Chicago) +16465588656,,94584316151#,,,,*442850# US (New York) Dial by your location +1 312 626 6799 US (Chicago) +1 646 558 8656 US (New York) +1 301 715 8592 US (Washington DC) +1 346 248 7799 US (Houston) +1 669 900 6833 US (San Jose) +1 253 215 8782 US (Tacoma) Meeting ID: 945 8431 6151 Passcode: 442850 Find your local number: https://purdue-edu.zoom.us/u/acK318mAQC<https://eur01.safelinks.protection.outlook.com/?url=https%3A%2F%2Fpurdue-ed…> ─────────────────────────────────── Rosa E. Diaz, PhD Electron Microscopy Research Scientist Birck Nanotechnology Center Purdue University 1205 W. State Street, West Lafayette, IN 47907-2057 Office: BRK-1272 Tel :765-496-1075 ───────────────────────────────────

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CasaXPS workshop announcement
by Abrol, Sangeeta Saddul 12 Jan '22

12 Jan '22

Sent on behalf of Dmitry Zemlyanov Hi BNC Members, I will be running CasaXPS workshop to teach how to analyze XPS data from January 18-20,2022 at 9.00am-1.00pm. Registration at: https://forms.gle/GJPLr58Yqugry5Mk6 Best regards, Dmitry ***************************************** Dmitry Zemlyanov, PhD Senior Research Scientist - Surface Science Application Purdue University Birck Nanotechnology Center, 1205 West State Street, West Lafayette, IN 47907-2057 Tel.: +1 (765) 496-2457 (office - BRK 1274) +1 (765) 496-6217 (lab - BRK 1077) Cell: +1 (765) 427-3813 Fax: +1 (765) 496-8299 mailto:dzemlian@purdue.edu web: https://www.purdue.edu/discoverypark/birck/facilities/equipment/Characteriz…

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Birck Fire Alarm has been cleared
by Jurss, Stephen E 11 Jan '22

11 Jan '22

All, The building can be re-occupied the cause was a leaking sprinkler line. Stephen Birck Safety Officer

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Peck Symposium Information
by Abrol, Sangeeta Saddul 11 Jan '22

11 Jan '22

Sent on behalf of Cindy Everhart Hi All- Attached please find information about the 17th Annual Garnet E. Peck Symposium. Best, Sangeeta Abrol Lead Administrative Assistant | Discovery Park | BRK 1027 Birck Nanotechnology Center|1205 West State St | West Lafayette, IN 47907 abrols(a)purdue.edu<mailto:abrols@purdue.edu> |purdue.edu/discoverypark/birck<http://purdue.edu/discoverypark/birck> o: 765-494 3509 [cid:image001.png@01D5E1BC.DCF172D0]

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Annual All User required training (Third Notice)
by Jurss, Stephen E 10 Jan '22

10 Jan '22

Greetings all, It's that time of year again! In order to maintain access to Birck, all BNC laboratory users (including any of the dry, solvent, acid, bio, and cleanroom labs) must obtain this year's annual safety training refresher Passport badge: BNC 151 - 2022 badge<https://www.openpassport.org/Badge/bnc151-2022/Criteria> BNC lab users must obtain this badge by 11:59:59 PM Monday, January 24th, or BNC lab access will be revoked. Please direct any questions or issues to sejurss(a)purdue.edu<mailto:sejurss@purdue.edu> and jcwirth(a)purdue.edu<mailto:jcwirth@purdue.edu>. To begin earning the badge, navigate to the following link and click the "Get Started" button: https://www.openpassport.org/Badge/bnc151-2022/Criteria NOTE: If you do not see the "Get Started" button at the badge page, or cannot access the page at all, you need to join the BNC Passport group: 1. Navigate to the BNC Passport Group page: https://www.openpassport.org/Group/bnc 2. Login with your Purdue ID and BoilerKey (if not already logged in) 3. Once at the BNC Passport Group page, click the "Join Group" button. To reiterate the requirements listed on the badge page, obtaining the badge requires: 1. A review of the BNC 151 - 2022 training slides<file:///C:/Users/jcwirth/AppData/Local/Microsoft/Windows/INetCache/Content.…> and the Chemical Hygiene Plan<https://www.purdue.edu/ehps/rem/documents/programs/chp2014.pdf>. 2. Passing a 25 question quiz on content from the BNC 151 - 2022 training slides<file:///C:/Users/jcwirth/AppData/Local/Microsoft/Windows/INetCache/Content.…> and the Chemical Hygiene Plan<http://www.purdue.edu/ehps/rem/documents/programs/chp2014.pdf>. An 80% or better is required to pass. The quiz may be retaken once, if needed. You may refer to the BNC 151 - 2022 training slides<file:///C:/Users/jcwirth/AppData/Local/Microsoft/Windows/INetCache/Content.…> and the Chemical Hygiene Plan<http://www.purdue.edu/ehps/rem/documents/programs/chp2014.pdf> during the quiz. Please note: * If you fail to obtain an 80% after a second attempt on the quiz, your submission must be manually reset. Email Steve Jurss (sejurss(a)purdue.edu<mailto:sejurss@purdue.edu?subject=BNC%20151%20Quiz%20Reset>) with the subject line "BNC 151 Quiz Reset" to setup a meeting to discuss any points of confusion and reset your submission. * BNC laboratory access (to any/all of the dry, solvent, acid, bio, or cleanroom laboratories) will be revoked if not completed by 11:59:59 PM on Monday, January 24th, 2022. * If not completed by the deadline, users wishing to regain BNC laboratory access will need to: * complete a more extensive version of the badge (50 questions >=90% to pass instead of 25 questions >=80%) * have their PI sign-off on the training * wait for the Friday after their badge is completed for access to be re-instated. Safety Officer Stephen Jurss

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BNC News: Week of January 10th
by Abrol, Sangeeta Saddul 10 Jan '22

10 Jan '22

[cid:image006.png@01D7401C.A3F567B0] Seminars /Workshops / Events/Announcement Prof. Venky Narayanamurti's Birck Distinguished Lecture on Dec. 13, 2021 is now available on nanoHUB. See below the link: https://nanohub.org/resources/35749 Rethinking the Nature and Nurture of Discovery Research Venky Narayanamurti Harvard University Abstract Research, particularly on the ?discovery? end of the R&D spectrum, is complex and easily misunderstood. Scientific advance doesn?t always precede, it often follows, engineering advance. Answering questions isn?t always the goal, finding questions often is. We don?t always seek to strengthen conventional wisdom, sometimes we seek to surprise it. What if we could rethink research so that its nurturing, through policy and management, harmonizes with its nature? ************ Announcement Mask Protocols in the Cleanroom We have observed various masking practices in the cleanroom recently so as a reminder for those using our Birck cleanroom, please continue to follow our COVID mask protocols. Masking requirements are either to use an M3 N95 mask by itself or use a standard mask under the cleanroom veil. If you have any questions please contact a staff member. Thanks, Ron Birck Engineering Birck Events<https://www.purdue.edu/discoverypark/birck/events/index.php> and Birck News<https://www.purdue.edu/discoverypark/birck/news/index.php> JOB POSTINGS: R&D Senior Design Engineer at Alpha & Omega Semiconductor Alpha & Omega Semiconductor is looking for a Senior Design Engineer who will work in a dynamic team environment at AOS headquarter located in Sunnyvale, CA. The main responsibility of this position is to work with marketing/process integration/product engineering group to develop silicon power device technology. Application link: Senior Design Engineer - Sunnyvale, CA - Alpha & Omega Semiconductor Jobs (applicantpro.com)<https://caosmd.applicantpro.com/jobs/2050960.html> R&D Senior Process Integration Engineer at Alpha & Omega Semiconductor Alpha & Omega Semiconductor is looking for a Senior Process Integration Engineer who will work in a dynamic team environment at AOS Semiconductor's leading technology fabrication facility (Jireh Semiconductor) located in Hillsboro, Oregon. The focus of this position is to work with device/process module/product engineering group to develop silicon power device process technology and improve existing technology yield. Primary responsibilities are to process flow implementation, electrical characterization (failure analysis), and wafer level testing yield monitoring. Application link: Entry Level MS or PHD Process Integration R&D Engineer - Hillsboro, OR - Jireh Semiconductor Jobs (applicantpro.com)<https://aosmd.applicantpro.com/jobs/1949301.html> Opening in OxideMEMS lab Sunil Bhave's OxideMEMS Lab <https://engineering.purdue.edu/oxidemems/publications.html> explores inter-domain coupling in Opto-mechanical, Spin-Acoustic and Atom-MEMS devices. PhD, Postdoctoral and Research Associate positions are available in these areas: * Superconducting qubit and cryo-CMOS circuits * Resonators and switches * MEMS-engine for LIDAR * Piezo-on-nitride transducers for atom-mechanics Expertise in many and most of Microfabrication, PiezoMEMS, Photonics, Quantum Mechanics, Microwave circuits, PCB design, ADS/HFSS, Comsol, Python and Labview is required. Please send CV to bhave(a)purdue.edu<mailto:bhave@purdue.edu> if you are interested link<http://interested.link> Nanofabrication Engineer at Microsoft Microsoft Azure Quantum at Station Q Purdue seeks a nanofabrication engineer in the device fabrication group. You will join a multi-disciplinary team of theoretical and experimental physicists, materials scientists, and hardware and software engineers working at the forefront of quantum computing. You should have experience in device fabrication and characterization techniques. Our work at Station Q Purdue in West Lafayette, Indiana is part of global Microsoft Quantum research effort in topological quantum computing. Responsibilities: Responsibilities include develop, operate, and characterize semiconductor device fabrication processes in the Birck Nanotechnology Center cleanroom facilities located at Purdue University. Accurately documenting and effectively communicating all procedures and results to the larger research group is an essential aspect of the position. The candidate may also be required to assist in the maintenance of equipment. Qualifications: A successful candidate must have: * * Master's degree in Physics, Materials Science or Electrical Engineering. Other engineering disciplines will also be considered. * * Hands-on experience working with some or all of the following semiconductor process areas: lithography, thin film deposition and etch. * * Ability to follow protocols to operate sophisticated experimental equipment and to safely work with industrial solvents, acids, and bases in a cleanroom environment * * Excellent written and oral communication skills. * * Proficiency at accurately documenting processes and protocols. * * Strong attention to detail and good organizational skills. * * Strong desire to work in a collaborative international team. Preference may be given to candidates with the following additional qualifications: * * Industry experience in semiconductor device process integration. * * Expertise in thin film characterization, both structural and electrical. * * Familiarity with design and layout tools for chip scale devices. Please send your resume to flgriggi(a)microsoft.com<mailto:flgriggi@microsoft.com>, selected candidates will be contacted for interviews. Graduate Research Assistantship Opportunity: Deposited Gate Oxides for SiC MOSFETs Up to two graduate research assistantships are available in the area of silicon carbide metal-oxide-semiconductor (MOS) devices. SiC is a wide bandgap semiconductor with a high critical field, making it an exciting material for power electronic devices. SiC MOSFETs are now commercially available, but do not yet achieve their full potential. Our group is approaching this problem from several directions, including a new device trench MOSFET geometries inspired by modern FinFETs and alternative gate insulator fabrication methods. Research activities will include fabrication and characterization of SiC MOS capacitors and MOSFETs with gate oxides formed by thermal oxidation, atomic layer deposition (ALD), and other methods. The student will gain a detailed understanding of the physics of the MOS interface and will learn various methods of characterizing devices, including MOS CV analysis, interface state density and carrier mobility. For more information or to apply, send resume and contact information to: Dallas Morisette Research Assistant Professor morisett(a)purdue.edu<mailto:morisett@purdue.edu> NSAC Fab Forum NSAC Fab Forum every Tuesday 2:00pm-2.30pm NSAC Coffee Hour NSAC Fab Forum every Friday 2:00pm-2.30pm Birck Nanotechnology Center Advanced Capabilities Plasma-Therm Apex ICP RIE Etcher<https://wiki.itap.purdue.edu/display/BNCWiki/Plasma-Therm+Apex+SLR> [cid:image001.png@01D80631.59F2D400] * ICP Power up to 2,000W and Bias Power up to 600W * Configured with 10 Process Gasses * Chamber and Chuck Temperatures up to 60C Other Capabilities: Has End Point Detection capabilities with a laser-based system which measures the laser signal reflected from a target location on the substrate surface. Location: BRK Cleanroom Bay K Contact: Francis Manfred (fmanfred(a)purdue.edu) <mailto:fmanfred@purdue.edu> Please visit the Birck Wiki to learn about the wide array of fabrication and characterization equipment at the facility<https://wiki.itap.purdue.edu/display/BNCWiki/> ***To post an announcement in the weekly BNC E-news please send to Sangeeta Abrol @ abrols(a)purdue.edu***<mailto:abrols@purdue.edu***> Follow us on Facebook and Twitter [Facebook icon]<https://www.facebook.com/nano.purdue.edu/> [Twitter icon] <https://twitter.com/BNCPurdue>

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Cleanroom Equipment Logging Kiosk Updates
by Hosler, Richard S 04 Jan '22

04 Jan '22

Dear Birck Cleanroom Research Community, As part of a continuing initiative to understand and improve equipment and process usage patterns at Birck, we are upgrading the tool logging kiosks that have been deployed throughout the Scifres clean room. Previously we had been using tablet-based kiosks, but after some usage and feedback we have moved onto touchscreen chromebook laptops with physical keyboards. This will facilitate easier and faster use of the logging tools. This is being implemented immediately, at the start of the 2022 calendar year. When you have a session reserved on any of the tools below, you must use the chromebook kiosk to create a short log entry. This is done by clicking the 'Create [Tool] Log' icon that appears when the system is woken up. Just answer the questions presented to the best of your knowledge. If the tool involves multiple subsequent sessions you can create one electronic log entry per run type. You can also view the log entries for each tool by clicking the 'View [tool] Log' link. This is good for determining recent system usage patterns. If you forget to create a log entry at the time of use you can use the links below to access the kiosk wiki pages from anywhere. Other features include using the kiosk to log into iLabs or submitting a trouble ticket. Kiosks are in place for the following tools: * Evaporation Core<https://wiki.itap.purdue.edu/display/BNCWiki/Evaporator+Kiosk+Page+CB> (Across from Panasonic) o CHA 1&2 o Lesker Flexible Substrate o Leybold o PVD Metal/Magnetic o PVD GLAD * Panasonic Etcher<https://wiki.itap.purdue.edu/display/BNCWiki/Panasonic+E620+Kiosk+CB> (At Panasonic) o Panasonic E620 o Apex Etcher (Soon) * Protemp Furnaces<https://wiki.itap.purdue.edu/display/BNCWiki/Protemp+Furnaces+Kiosk+CB> (At Protemp #1 Console) o Tubes 1-9 * PECVD/Thermal Anneal<https://wiki.itap.purdue.edu/display/BNCWiki/PECVD+and+Thermal+Anneal+Kiosk…> (Between Blue M and Apex) o Apex HDPCVD o Axic PECVD o RCA Hood o Blue M o Jipelec RTA * Sputtering Core<https://wiki.itap.purdue.edu/display/BNCWiki/Sputtering+Kiosk+Page+CB> (Next to XeF on right side of sputtering bay) o PVD Nitride o PVD Metal/Dielectric o PVD 4-Target Magnetic o PVD 6-Target Magnetic o PVD Flexible Substrate * STS Etchers<https://wiki.itap.purdue.edu/display/BNCWiki/STS+Etch+Kiosk+CB> (Between STS Etchers) o STS AOE o STS ASE * Heidelberg<https://wiki.itap.purdue.edu/display/BNCWiki/Heidelberg+MLA150+Maskless+Ali…> (At Heidelberg console) o MLA150 * AJA Ion Mill (coming soon) Thanks for your assistance and let me know if you have any questions. Rich Hosler

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Annual Birck Access Training Required
by Jurss, Stephen E 03 Jan '22

03 Jan '22

Greetings all, It's that time of year again! In order to maintain access to Birck, all BNC laboratory users (including any of the dry, solvent, acid, bio, and cleanroom labs) must obtain this year's annual safety training refresher Passport badge: BNC 151 - 2022 badge<https://www.openpassport.org/Badge/bnc151-2022/Criteria> BNC lab users must obtain this badge by 11:59:59 PM Monday, January 24th, or BNC lab access will be revoked. Please direct any questions or issues to sejurss(a)purdue.edu<mailto:sejurss@purdue.edu> and jcwirth(a)purdue.edu<mailto:jcwirth@purdue.edu>. To begin earning the badge, navigate to the following link and click the "Get Started" button: https://www.openpassport.org/Badge/bnc151-2022/Criteria NOTE: If you do not see the "Get Started" button at the badge page, or cannot access the page at all, you need to join the BNC Passport group: 1. Navigate to the BNC Passport Group page: https://www.openpassport.org/Group/bnc 2. Login with your Purdue ID and BoilerKey (if not already logged in) 3. Once at the BNC Passport Group page, click the "Join Group" button. To reiterate the requirements listed on the badge page, obtaining the badge requires: 1. A review of the BNC 151 - 2022 training slides<file:///C:/Users/jcwirth/AppData/Local/Microsoft/Windows/INetCache/Content.…> and the Chemical Hygiene Plan<https://www.purdue.edu/ehps/rem/documents/programs/chp2014.pdf>. 2. Passing a 25 question quiz on content from the BNC 151 - 2022 training slides<file:///C:/Users/jcwirth/AppData/Local/Microsoft/Windows/INetCache/Content.…> and the Chemical Hygiene Plan<http://www.purdue.edu/ehps/rem/documents/programs/chp2014.pdf>. An 80% or better is required to pass. The quiz may be retaken once, if needed. You may refer to the BNC 151 - 2022 training slides<file:///C:/Users/jcwirth/AppData/Local/Microsoft/Windows/INetCache/Content.…> and the Chemical Hygiene Plan<http://www.purdue.edu/ehps/rem/documents/programs/chp2014.pdf> during the quiz. Please note: * If you fail to obtain an 80% after a second attempt on the quiz, your submission must be manually reset. Email Steve Jurss (sejurss(a)purdue.edu<mailto:sejurss@purdue.edu?subject=BNC%20151%20Quiz%20Reset>) with the subject line "BNC 151 Quiz Reset" to setup a meeting to discuss any points of confusion and reset your submission. * BNC laboratory access (to any/all of the dry, solvent, acid, bio, or cleanroom laboratories) will be revoked if not completed by 11:59:59 PM on Monday, January 24th, 2022. * If not completed by the deadline, users wishing to regain BNC laboratory access will need to: * complete a more extensive version of the badge (50 questions >=90% to pass instead of 25 questions >=80%) * have their PI sign-off on the training * wait for the Friday after their badge is completed for access to be re-instated. Safety Officer Stephen Jurss

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Happy Holidays, 2022
by Shakouri, Ali 24 Dec '21

24 Dec '21

Dear All, I hope you are enjoying end of the year holidays. I would like to thank sincerely everybody who helped to organize the Birck holiday party last week. It was great to see many students, staff and faculty in person. I appreciate very much kind words of Zhihong, Vlad, Sasha and everybody else who participated. My holiday messages typically include a photo of Birck with beautiful snow surrounding the center (this year’s snow is yet to come!). Venky Narayanamurti’s seminar couple of weeks ago made reference to an outstanding speech by Ralph Bown who said in 1952: “vitality of a research organization is only a composite of the spirit of the people in it. It has little to do with buildings or equipment, although indeed these things are important mechanical factors in its existence.” Instead of a photo, I have included below a link to Bown’s article to acknowledge the outstanding contribution of everybody who has helped create Birck's vibrant research atmosphere. As we are dealing with challenges due to COVID and some of the unfortunate polarizations in the country, it is good to be reminded about the importance of human relations and imagination to overcome differences and in shaping our future. As Whitehead said almost century ago, the “justification for a university is to preserve the connection between knowledge and the zest of life, by uniting the young and the old in the imaginative consideration of learning.” Below, I have included a link to Purdue 2050, Conference of the Future, where several guests and colleagues shared their imagination about the future we want to create for our children. If you have couple of minutes, here is a short video summary: https://youtu.be/_Jogf4PVfgw Thanks to everybody for providing an amazing environment to work, to grow and for all of the friendship and advice. This has been a real privilege to work with all of you. Best regards, Ali PS. Here are the links: ********************************** Vitality of a Research Institution and how to maintain it Ralph Bown, Vice President at Bell Labs Speech at Sixth annual conference on the administration of research in 1952 https://maceip.github.io/bell-labs-innovation/ ********************************** Purdue 2050: Conference of the Future https://nanohub.org/resources/33240 * Future of Healthcare. Peter Embi, president of Regenstrief Institute, healthcare professionals; Joanne Burns -CSO Cerner ; Gopal Chopra -CEO RadiantHeart; a leading cancer researcher (Daniella Matei) and her patient (Susan Gubar), a well-known IU author and cancer survivor * Supriyo Datta, Quantum Technologies * Deborah Wince-Smith, President and CEO of the Council on Competitiveness; Age of Illumination. * Future of Manufacturing and Factories by Michael King, President of LHP Data Analytics; Jan-Anders Mansson co-director of Indiana Manufacturing Institute * Discovery Park District 2050 by David Broecker * Digital Privacy by Alessandro Acquisti, Carnegie Mellon University * Anna Ridler, Art and Artificial Intelligence; Anne Fliotsos, International Telepresence Theatre * Smart Affordable Housing, Gary Hobbs (BWI) * Nanotechnology, Internet of Things and Data Analytics 2050; Muhammad Ashraful Alam and Ali Shakouri Exhibitions: (now available at Birck thanks to Neil Dilley’s great efforts) Digital Borneo, immersive sounds from 100 million years old rainforest prepared in collaboration between Bryan Pijanowski’s Center for Soundscape Engineering and the transparent and flexible speakers fabricated by Miko Cakmak’s group at the Birck Center; Plasmonic Kaleidoscope -a collaboration between Sasha Boltasseva’s nanophotonics group and a local artist at polytechnic, Esteban Garcia. https://www.purdue.edu/discoverypark/2050/index.php **********************************

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BNC Holiday Mode
by Reger, Ronald K 22 Dec '21

22 Dec '21

Dear All Birck Nanotechnology Center Researchers, As of 3:30 pm today, Wednesday December 22, the Birck center has been put into winter recess mode. Hazardous gases have been turned off, and the other winter recess procedures/protocols are now in place. The center will remain in this state until Monday morning, January 3 when the university reopens. For details about the Birck recess mode please see the below announcement that we have been publishing every week for several weeks. Have a happy holiday season and we will see you again in the new year! Previous announcement: On behalf of the Birck Leadership Team....... Dear Birck Research Community, The Purdue winter recess occurs December 23rd through January 2. The university is officially closed during this time and reopens on Monday January 3. As we have done in past years, the Birck Nanotechnology Center will remain available for research but will be unstaffed and hazardous gasses will be unavailable. As always if you plan to do any work over the recess please follow all applicable Protect Purdue protocols. Following is a description of the Birck center during this period of university closure: 1. All labs and cleanroom will be open. 2. All hazardous gases will be unavailable. 3. HF, BOE, and TMAH chemical processing will be allowed as long as a buddy is present. 4. Precursors for ALD systems will be available. 5. No shipping or receiving is being done at any building on campus. 6. The custodians will not be working so restrooms will not be maintained, and sanitation of touch surfaces will not be done. * We encourage users to keep the facility clean and be extra vigilant about the hygiene and COVID risks. 7. A few engineering and building staff may walk through occasionally for major issues but availability will be very limited and could be impacted due to COVID restrictions. * Faculty and senior researchers are encouraged to be more proactive (e.g. occasional walk throughs checking the labs where there is ongoing research). Email Birck management if you notice anything. Since there will be limited staff support during this winter recess the research groups are strongly encouraged to accomplish as much processing as possible before gases are turned off on Dec. 22. See the following for more detailed information (this will be up on the BNC Wiki): 2021-12-23 to 2022-01-03: Reduced Holiday Operations Due to Purdue's Winter Recess hazardous gases will be unavailable from 3:30 PM Wednesday, December 22 until 8:00 AM on Monday, Jan 3rd. Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the "buddy" system). Please note the following changes to our normal operation: * ALD sources will remain available * Unavailable gases: * Ammonia (NH3) * Boron trichloride (BCl3) * Chlorine (Cl2) * Dichlorosilane (H2Cl2Si) * Hydrogen (H2) * Hydrogen Sulfide (H2S) * Krypton Fluoride (KrF) * Methane (CH4) * Nitric Oxide (NO) * Silane (SiH4) * Trichlorosilane (HCl3Si) * Tools affected: * Reduced capability: * PVD Nitride Sputtering System (NH3 unavailable) * Tube 1 Clean Ox (H2 unavailable, dry oxidation only) * Tube 4 Field OX (H2 unavailable, dry oxidation only) * Tube 7 General Oxidation (H2 unavailable, dry oxidation only) * Panasonic (Cl2 and BCl3 unavailable) * Plasma-Therm Apex SLR ICP RIE Etcher (H2, Cl2 and BCl3 unavailable) * Shutdown: * Axic PECVD (NH3 & SiH4 unavailable) * Easy Tube 3000 DVD (CH4 unavailable) * Epigress (SiH4 unavailable) * H2S CVD (H2S & H2 unavailable) * Nitric Oxide Anneal (NO unavailable) * Plasma-Therm Apex SLR HDPCVD (SiH4 unavailable) * Tube 2 Nitride (NH3 and HCl3Si unavailable) * Tube 3 LTO (SiH4 unavailable) * Tube 6 Polysilicon (SiH4 unavailable) * Work with highly dermally toxic materials (25% TMAH, BOE, HF) ABSOLUTELY requires a buddy within eyesight at all times. * Custodial staff will not be working. * There will be limited restocking of shared use supplies. * There will be limited availability of engineering staff to answer questions or repair down equipment. * On metallization tools sources will not be changed and depositions must be < 200 nm. Contact Steve Jurss (sejurss(a)purdue.edu<mailto:sejurss@purdue.edu>) with any questions.

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