Peter asks two important and relevant questions. I am sharing my reply below. Sunil.
Begin forwarded message:
From: Sunil Ashok Bhave <bhave@purdue.edu> Subject: Re: [Bnc-faculty-all-list] Data logging inside Scifres Date: August 14, 2019 at 4:02:10 PM EDT To: Peter Bermel <pbermel@ecn.purdue.edu>
Hi Peter,
All data will be within the Purdue Firewall. You will need an active PUID to look at it. The data will be raw and instrument specific. So there will be no information saved about an overall process flow or rationale.
thank you, Sunil.
On Aug 14, 2019, at 12:26 PM, Peter Bermel <pbermel@ecn.purdue.edu <mailto:pbermel@ecn.purdue.edu>> wrote:
Hi Sunil,
I agree with the concept: improved process control and yield is very desirable. Regarding the data disclosure, is it all within Purdue or is it public information, and if the latter, will the data include contextual information like the rationale or overall process flow? Thanks.
Best Regards,
Peter
On 8/14/2019 1:20 PM, Bhave, Sunil A wrote:
Hello,
We are starting a new data logging project inside the Scifres cleanroom at Birck, beginning next week.
Background: I have seen 3 different kinds of log book entries so far and these are just examples. 1. electronic only — Jeol Ebeam. iLab enabling asks for beam current. and Justin has mentioned that it could ask for more. 2. manual and filled completely — ionMill. A new tool with a very controlled and small user set. 3. manual and lots of missing spots — Panasonic. An older tool with massive variety of users across all domains and materials. I have even heard some people forget to log.
My Motivation behind this project is 1. Keep all tools operational and working in prime condition 24/7 2. Perform preventive maintenance, study tool aging and drift, find rogue as well as premier users 3. Study impact of micro and macro events like shutdowns and tool installs. 4. Position Scifres as the premier university facility with a unique and powerful toolset for performing research in New Era Microsystems.
My Approach is to generate a massive database of tool data not just populated with entries before the tool is used, but also afterwards by strongly urging users to report on things like CD, sidewall angles, etch selectivity, overheating of PR, target vs achieved film thickness, particle counts and share SEMs, AFM scans of step heights, XRD, etc
In order to achieve this, we will start encouraging All users to share information in logbooks and data-entry sites. Tracy Hudson and I met with Purdue’s legal counsel and have confirmed that such data collection is legal. However I forsee:
some PIs will agree to this plan and to them I would like you to strongly encourage and nudge your students to do it (and also improve their handwriting =P ) some PIs may have questions or concerns, and to those I ask you meet me individually and I will work with you to address your concerns some PIs may not want to be part of this, and to those I ask you meet me individually so I understand why you don’t want to some PIs may have peculiar grants and funding from industry that forbid this kind of data logging. and for those, I request you email me and tell me exactly why, which program, which students and staff should be exempt from logging.
My office is in Birck 2021. Please reach out to Jaime Turner jjturner@purdue.edu <mailto:jjturner@purdue.edu> to request meetings as she has access to my calendar.
thank you, Sunil.
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