Polishing Lab Chemical Update
Hi ARMS 2132 Researchers, Good news! REM has approved us to use the following chemicals again: * Nitric Acid (You are still prohibited from making Nital. All Nital use must be from a commercially made solution.) * Hydrofluoric Acid (Note: You will not be given the key to the HF cabinet without your HF buddy and proper training.) * Perchloric Acid * Base Piranha Solution At this time, the MSE Safety Committee plans to continue to keep all acids, oxidizers, and nital in the locked cabinets. You are still required to submit a hazard assessment (HA) and SDS/SOP in order access chemicals in these groups. Stay Safe, Jenni Fifer Safety & Mechanical Testing Lab Technician Materials Science & Engineering Purdue University Phone: 765-494-9718 Email: fiferj@purdue.edu
Hi All, I was asked to make a comment on the chemical SOPs. The etchant SOPs for ARMS 2132 do not require updates at this time unless notified otherwise. I apologize for not adding this note to my original email. Stay Safe, Jenni Fifer Safety & Mechanical Testing Lab Technician Materials Science & Engineering Purdue University Phone: 765-494-9718 Email: fiferj@purdue.edu From: Jennifer Louise Fifer Sent: Tuesday, December 7, 2021 11:40 AM To: Adams, Caitlin Jamie <cjadams@purdue.edu>; Britney N Bailey <baile261@purdue.edu>; Clayton Stewart Barlow <barlow11@purdue.edu>; Barnard, James Peter <barnardj@purdue.edu>; Saurav Basu <basu24@purdue.edu>; Garrett William Behrje <gbehrje@purdue.edu>; Bidna, Gavin David <gbidna@purdue.edu>; Nor Fakhri Danial Bin Norazize <nnoraziz@purdue.edu>; Matthew L Binkley <mbinkle@purdue.edu>; Riordan A Boyle <boyle49@purdue.edu>; Brandt, Olivia N <obrandt@purdue.edu>; MaiLan Bui Brown <brow1503@purdue.edu>; Grant Robert Carnal <gcarnal@purdue.edu>; Ryan Edward Carr <carr94@purdue.edu>; Rok Rweyemamu Cerne Jr. <rcerne@purdue.edu>; Tae Hoo Chang <chang466@purdue.edu>; Chen, Ching-Chien <chen3785@purdue.edu>; Harley Jaquette Clark <clark614@purdue.edu>; Clement, Caleb Denton <clemen45@purdue.edu>; Hannah N DeBoer <hdeboer@purdue.edu>; Abhijeet Dhiman <adhiman@purdue.edu>; Hannah Doyle <doyle87@purdue.edu>; David Enrique Farache <dfarache@purdue.edu>; Fink, John Thomas <fink31@purdue.edu>; Endrina S Forti <eforti@purdue.edu>; Hannah Nicole Fowler <fowlerh@purdue.edu>; Blair N Francis <franci13@purdue.edu>; Kimberly Nicole Giannini <giannink@purdue.edu>; Matthew Francis Giroux <girouxm@purdue.edu>; Hugh Patrick Grennan <hgrennan@purdue.edu>; Corbin M Grohol <cgrohol@purdue.edu>; Park Gyuchul <park855@purdue.edu>; Ryan Christopher Heavener <rheavene@purdue.edu>; Hernandez, Austin M <herna522@purdue.edu>; Herring, John Francis <herring3@purdue.edu>; David Samuel Ho <ho141@purdue.edu>; Hoppenrath, Luke Anthony <lhoppenr@purdue.edu>; Duo Huang <huan1023@purdue.edu>; Xinzhu Huang <huan1239@purdue.edu>; Ziyun Huang <huan1318@purdue.edu>; Abigail Ann Jachim <jachim@purdue.edu>; Kate F Jarvis <jarvis8@purdue.edu>; Jo, Soungwan <jo46@purdue.edu>; Shea K Jones <jone1573@purdue.edu>; Adam Nathaniel Katz <katz21@purdue.edu>; Koneru, Abbey Elizabeth <konerua@purdue.edu>; Ethan Christopher Korte <kortee@purdue.edu>; Jessica Lavorata <jlavorat@purdue.edu>; Diego A Leoni <dleoni@purdue.edu>; Weidong Liu <liu2568@purdue.edu>; Yailuth Alexandra Loaiza Lopera <yloaizal@purdue.edu>; Jack Michael Lopez <lopez86@purdue.edu>; Lu, Juanjuan <lu790@purdue.edu>; Luktuke, Amey Avinash <aluktuke@purdue.edu>; Sean Michael MacPherson <smacphe@purdue.edu>; Devin Patrick Madigan <dmadigan@purdue.edu>; Ethan Johnson Mann <mann78@purdue.edu>; Mann, Thomas R <mann104@purdue.edu>; Tess D Marconie <tmarconi@purdue.edu>; Sae Matsunaga <smatsun@purdue.edu>; Ana Katharine McArdle <amcardl@purdue.edu>; Mikels, Keifer Riley <kmikels@purdue.edu>; Robert Edward Miller <mill2391@purdue.edu>; Dane Otto Moebius <dmoebius@purdue.edu>; Debapriya Pinaki Mohanty <dmohant@purdue.edu>; Nagarpita Moka Vidyanag <nmokavid@purdue.edu>; Zara Moleinia <zmolaein@purdue.edu>; Karan Moti Motwani <kmotwan@purdue.edu>; Tyler Steven Muller <mullert@purdue.edu>; Katelyn Sarah Mullins <mullin21@purdue.edu>; Anna Murray <murra191@purdue.edu>; Zeynep Mutlu <zmutlu@purdue.edu>; Orta Guerra, Rodrigo <rortague@purdue.edu>; Ozer, Ali <ozera@purdue.edu>; Kezia Skye Starr Peck <peck28@purdue.edu>; Xin Li Phuah <xphuah@purdue.edu>; Pibulchinda, Pattiya <ppibulc@purdue.edu>; Quentin Dwight Pitter <qpitter@purdue.edu>; Brhayan Stiven Puentes Rodriquez <bpuentes@purdue.edu>; Haozheng Qu <qu34@purdue.edu>; Reger, Megan Rose <reger1@purdue.edu>; James Ro <roj@purdue.edu>; Schrad, Caleb Matthew <schradc@purdue.edu>; Madeline K Schroeder <schro118@purdue.edu>; Akul Nimish Seshadri <seshada@purdue.edu>; Shang, Anyu <shanga@purdue.edu>; Akshat Sharma <sharm318@purdue.edu>; Qing Shen <shen441@purdue.edu>; Shen, Chao <shen569@purdue.edu>; Sinclair, Daniel R <sinclai3@purdue.edu>; Kushagra Singh <singh500@purdue.edu>; Ryan Parker Siu <siu2@purdue.edu>; Dawson Michael Smith <smit3180@purdue.edu>; Julia Ann Smith <smit3417@purdue.edu>; Smith, Benjamin P <smit4180@purdue.edu>; Somani, Abhishek <somani8@purdue.edu>; Benjamin Thomas Stegman <bstegma@purdue.edu>; Brandon James Stewart <stewa263@purdue.edu>; Stirrup, Kerry Ann M <kstirrup@purdue.edu>; Connor Daniel Sullivan <sulli256@purdue.edu>; Tianyi Sun <sun821@purdue.edu>; Talah Tayeb <ttayeb@purdue.edu>; Allison John Thornton <thornt21@purdue.edu>; Lucas Allen Topliff <ltopliff@purdue.edu>; Shivam Tripathi <tripath6@purdue.edu>; Jung-Ting Tsai <tsai92@purdue.edu>; Tucker, Victoria Anne <vtucker@purdue.edu>; Ana Maria NA Ulloa Gomez <aulloago@purdue.edu>; Juan Carlos Verduzco Gastelum <jverduzc@purdue.edu>; Victor Gilles Wallemacq <vwallema@purdue.edu>; Ethan C Wang <wang3775@purdue.edu>; Lauren M Washington <washin55@purdue.edu>; Erich Weaver <weaver60@purdue.edu>; Brandon J Wells <wells89@purdue.edu>; Carson Davis Work <cwork@purdue.edu>; Yifan Wu <wu1394@purdue.edu>; Pengyu Xu <xu1061@purdue.edu>; Xu, Ke <xu1522@purdue.edu>; Bo Yang <yang837@purdue.edu>; Yang, Morris Menghuan <yang1991@purdue.edu>; Di Zhang <zhan2923@purdue.edu>; Zhang, Yizhi <zhan4094@purdue.edu>; Bohua Peter Zhang <zhan4425@purdue.edu> Cc: MSE Safety <mse-safety@purdue.edu>; msefaculty-list@ecn.purdue.edu; msepostdoc-list@ecn.purdue.edu Subject: Polishing Lab Chemical Update Hi ARMS 2132 Researchers, Good news! REM has approved us to use the following chemicals again: * Nitric Acid (You are still prohibited from making Nital. All Nital use must be from a commercially made solution.) * Hydrofluoric Acid (Note: You will not be given the key to the HF cabinet without your HF buddy and proper training.) * Perchloric Acid * Base Piranha Solution At this time, the MSE Safety Committee plans to continue to keep all acids, oxidizers, and nital in the locked cabinets. You are still required to submit a hazard assessment (HA) and SDS/SOP in order access chemicals in these groups. Stay Safe, Jenni Fifer Safety & Mechanical Testing Lab Technician Materials Science & Engineering Purdue University Phone: 765-494-9718 Email: fiferj@purdue.edu<mailto:fiferj@purdue.edu>
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Jennifer Louise Fifer