Professor Erk asked me to forward the following seminar information to you: Purdue University School of Chemical Engineering Graduate seminar series Prof. Paul Nealey Institute of Molecular Engr., University of Chicago "Directed Assembly of Block Copolymers on Lithographically Defined Chemically Nanopatterned Substrates" April 2, 2013 9:00-10:20 a.m. FRNY G140 Reception at 8:30 a.m. in Henson Atrium Abstract: The use of block copolymers in the lithographic process is an attractive strategy to augment and enhance the capabilities of current tools in nanomanufacturing. We employ electron beam and 193 nm immersion lithography to fabricate chemically patterned surfaces. Block copolymer films are deposited on the surfaces and annealed. By judicious choice of the chemistry and the geometry of the patterned regions, the domain structure of the block copolymer film may be directed to assembly into desirable architectures for applications such as bit patterned media or integrated circuits. Challenges that remain in materials and process development include delineation of the degree of perfection that can be obtained, and fabrication of sub 10 nm features in manufacturing-relevant processes. Here we report 1) the relationships between attributes of the chemical pattern and the degree of perfection of the assembled block copolymer films, 2) two approaches to processing films on chemical patterns to enable assembly of high resolution copolymers with differing block surface energies, and 3) design principles for the synthesis of new block copolymers for directed self-assembly with sub 10 nm features. Bio: Paul F. Nealey is currently the Brady W Dougan Family Professor in Molecular Engineer-ing at the new Institute for Molecular Engineering of the University of Chicago. His research interests include nanofabrication techniques based on advanced lithography and directed self-assembly, development of imaging materials for alternative lithographic strategies, and dimension dependent material properties of nanoscopic macromolecular structures. He is a fellow of the American Physical Society, and has received the National Science Foundation Career Award, the Camille Dreyfus Teacher-Scholar Award, the University of Wisconsin Romnes Fellowship, the Nanoscale Science and Engineering Forum Award from the American Institute of Chemical Engineers, and the Arthur K. Doolittle Award from the American Chemical Society. He was also the Founding Director of the National Science Foundation-funded Nanoscale Science and Engineering Center in Templated Synthesis and Assembly at the Nanoscale.