Hi, Casey, Can we etch silica(CF3 gas) and photoresist (O2 gas) with this etcher? Thank you. ------------------------------------------------------------- Hsiao-Kuan Yuan Purdue University School of Electrical and Computer Eng. Address: Box 545, EE building 465 Northwestern Ave. West Lafayette, IN 47907-2035 Phone: office (765) 494-3501 e-mail: hyuan@purdue.edu -----Original Message----- From: bnc-grads-list-bounces@ecn.purdue.edu [mailto:bnc-grads-list-bounces@ecn.purdue.edu] On Behalf Of Casey Heaton Sent: Tuesday, August 01, 2006 10:24 AM To: bnc-grads-list@ecn.purdue.edu Cc: hsharifi@purdue.edu; lubelski@ecn.purdue.edu Subject: [BNC-grads-list] Barrel etcher in BNC clean room The barrel etcher is now up. It is similar to the old barrel in EE but not enough so that people can just start running it, re-training will be required. Unfortunately I do not as yet have any time scheduled for training, this week is completely full with other commitments. If you have something that just can't wait then I'll try to find some time to train. Hopefully Hasan will be back next week, he and I share responsibilities and this should free up time for training. Please be patient as we try to accommodate training with the need to get other critical pieces of equipment up and running. Thank You, Casey _______________________________________________ Bnc-grads-list mailing list Bnc-grads-list@ecn.purdue.edu https://engineering.purdue.edu/ECN/mailman/listinfo/bnc-grads-list