Please note that the cleanroom humidity will be out of specified limits on Friday during the ultrapure water outage. This can impact various operations, but can have a very pronounced affect on photo-speed in lithography operations utilizing POSITIVE PHOTORESIST. Thank you again for your patience and cooperation, John Weaver John R. Weaver Facility Manager Birck Nanotechnology Center Purdue University (765) 494-5494 jrweaver@purdue.edu