Friday, May 17^th

OSA – Purdue Chapter Meeting

Birck 1001 at 11:00 am

New members welcome

Ice Cream Social

Birck Atrium at 3:00 pm

Everyone is invited!

***Special Notice***

The Suss MA24, a single or double sided mask aligner, is now available for use at the Birck Nanotechnology Center.  Top and bottom masks are aligned to each other and locked together for simultaneous exposure from two separate UV lamp sources.  The bottom mask holder uses a contact only exposure while the top mask holder is a proximity only exposure. This mask aligner system can process 4 inch wafers (100mm) only and can be programmed for single bottom only exposure or double top and bottom together exposures.

Please contact Mike Courtney for training and user qualification of the Suss MA24 mask alignment system.

Research computing coffee consultations for would-be, new and experienced users

Weekly “Coffee Break Consultations” with ITaP Research Computing (RCAC) staff are informal meet ups with benefits for new and experienced high-performance computing users or faculty, staff and students just thinking about adding the tool to their research toolbox. More information is available at www.itap.purdue.edu/newsroom/detail.cfm?newsId=2788 or by emailing rcac-help@purdue.edu.

Greg Kline, science and technology writer

Thank you,

Heather Anthrop

Birck Nanotechnology Center

Purdue University

1205 West State Street

West Lafayette, IN 47907

(765) 494-7053