Please note that the cleanroom humidity will be out of specified limits on Friday during the ultrapure water outage.  This can impact various operations, but can have a very pronounced affect on photo-speed in lithography operations utilizing POSITIVE PHOTORESIST.  

 

Thank you again for your patience and cooperation,

 

John Weaver

 

John R. Weaver

Facility Manager

Birck Nanotechnology Center

Purdue University

(765) 494-5494

jrweaver@purdue.edu